New approach for quartz dry etching using hardmask for sub-90-nm photomask technology
- 著者名:
Huh, S. ( Samsung Electronics Co., Ltd. (South Korea) ) Yoon, K.-S. ( Samsung Electronics Co., Ltd. (South Korea) ) Jang, I.-Y. ( Samsung Electronics Co., Ltd. (South Korea) ) Hwang, J.-H. ( Samsung Electronics Co., Ltd. (South Korea) ) Shin, I.-K. ( Samsung Electronics Co., Ltd. (South Korea) ) Choi, S.-W. ( Samsung Electronics Co., Ltd. (South Korea) ) Han, W.-S. ( Samsung Electronics Co., Ltd. (South Korea) ) - 掲載資料名:
- Photomask and Next-Generation Lithography Mask Technology XI
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5446
- 発行年:
- 2004
- 開始ページ:
- 19
- 終了ページ:
- 27
- 総ページ数:
- 9
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819453693 [0819453692]
- 言語:
- 英語
- 請求記号:
- P63600/5446.1
- 資料種別:
- 国際会議録
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SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
8
国際会議録
The study of optical performance for quartz dry etching quality in ArF lithography [6349-12]
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12
国際会議録
Dry etching of chrome for photomasks for 100-nm technology using chemically amplified resist
SPIE-The International Society for Optical Engineering |