Forbidden-area avoidance with spacing technique for layout optimization

Forbidden-area avoidance with spacing technique for layout optimization

著者名:

Shi, S.C. ( Univ. of Hong Kong (Hong Kong China) )
Wong, A.K. ( Univ. of Hong Kong (Hong Kong China) )
Ng, T.-S. ( Univ. of Hong Kong (Hong Kong China) )

掲載資料名:

Design and process integration for microelectronic manufacturing II [sic] : 26-27 February 2004, Santa Clara, California, USA

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5379

発行年:

2004

開始ページ:

67

終了ページ:

75

総ページ数:

9

出版情報:

Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452924 [0819452920]

言語:

英語

請求記号:

P63600/5379

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013731
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Design and process integration for microelectronic manufacturing
回次:	2004 : 2nd
会議開催地:	Santa Clara, CA, USA
会議開催年:	2004.02.26-2004.02.27

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