Minimizing mask complexity for advanced optical lithography
- 著者名:
- Fritze, M. ( MIT Lincoln Lab. (USA) )
- Tyrrell, B. ( MIT Lincoln Lab. (USA) )
- 掲載資料名:
- Design and process integration for microelectronic manufacturing II [sic] : 26-27 February 2004, Santa Clara, California, USA
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5379
- 発行年:
- 2004
- 開始ページ:
- 30
- 終了ページ:
- 38
- 総ページ数:
- 9
- 出版情報:
- Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452924 [0819452920]
- 言語:
- 英語
- 請求記号:
- P63600/5379
- 資料種別:
- 国際会議録
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