Improving manufacturing variability control in advanced CMOS technology by using TCAD methodology

Improving manufacturing variability control in advanced CMOS technology by using TCAD methodology

著者名:

Chen, J. ( Texas Instruments Inc. (USA) )
Wu, J. ( Texas Instruments Inc. (USA) )
Liu, K. ( Texas Instruments Inc. (USA) )
Yang, H. ( Texas Instruments Inc. (USA) )
Scott, D. ( Texas Instruments Inc. (USA) )

掲載資料名:

Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5378

発行年:

2004

開始ページ:

215

終了ページ:

220

総ページ数:

6

出版情報:

Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452917 [0819452912]

言語:

英語

請求記号:

P63600/5378

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013730
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Data analysis and modeling for process control
回次:	2004
会議開催地:	Santa Clara, CA, USA
会議開催年:	2004.02.26-2004.02.27

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