Automated fault detection and classification of etch systems using modular neural networks

Automated fault detection and classification of etch systems using modular neural networks

著者名:

Hong, S.J. ( Georgia Institute of Technology (USA) )
May, G.S. ( Georgia Institute of Technology (USA) )
Yamartino, J. ( Applied Materials (USA) )
Skumanich, A. ( Applied Materials (USA) )

掲載資料名:

Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5378

発行年:

2004

開始ページ:

134

終了ページ:

141

総ページ数:

8

出版情報:

Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452917 [0819452912]

言語:

英語

請求記号:

P63600/5378

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013730
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Data analysis and modeling for process control
回次:	2004
会議開催地:	Santa Clara, CA, USA
会議開催年:	2004.02.26-2004.02.27

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