In-line lithography cluster monitoring and control using integrated scatterometry
- 著者名:
Pollentier, I. ( IMEC (Belgium) ) Cheng, S.Y. ( IMEC (Belgium) ) Baudemprez, B. ( IMEC (Belgium) ) Laidler, D. ( IMEC (Belgium) ) van Dommelen, Y. ( ASML (Netherlands) ) Carpaij, R. ( ASML (Netherlands) ) Yu, J. ( Tokyo Electron Ltd. (Japan) ) Uchida, J. ( Tokyo Electron Ltd. (Japan) ) Viswanathan, A. ( Tokyo Electron Ltd. (Japan) ) Chin, D. ( Tokyo Electron Ltd. (Japan) ) Barry, K. ( Tokyo Electron Ltd. (Japan) ) Jakatdar, N. ( Tokyo Electron Ltd. (Japan) ) - 掲載資料名:
- Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5378
- 発行年:
- 2004
- 開始ページ:
- 105
- 終了ページ:
- 115
- 総ページ数:
- 11
- 出版情報:
- Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452917 [0819452912]
- 言語:
- 英語
- 請求記号:
- P63600/5378
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
3
国際会議録
Application of scatterometry for CD and profile metrology in 193-nm lithography process development
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
11
国際会議録
Scatterometry measurements of line end shortening structures for focus-exposure monitoring [6152-70]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |