DOE manufacture with the DUV SLM-based Sigma7300 laser pattern generator

DOE manufacture with the DUV SLM-based Sigma7300 laser pattern generator

著者名:

Bjyrnyngen, P. ( Micronic Laser Systems AB (Sweden) )

Ekberg, M. ( Micronic Laser Systems AB (Sweden) )

ystrym, T. ( Micronic Laser Systems AB (Sweden) )

Fosshaug, H.A. ( Micronic Laser Systems AB (Sweden) )

Karlsson, J. ( Micronic Laser Systems AB (Sweden) )

Bjyrnberg, C. ( Micronic Laser Systems AB (Sweden) )

Nikolajeff, F.K. ( Uppsala Univ. (Sweden) )

Karlsson, M. ( Uppsala Univ. (Sweden) )

さらに 3 件

掲載資料名:

Optical Microlithography XVII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5377

発行年:

2004

開始ページ:

1866

終了ページ:

1875

総ページ数:

10

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452900 [0819452904]

言語:

英語

請求記号:

P63600/5377.3

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013729
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical Microlithography
回次:	2004 : 17th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2004.02.24-2004.02.27

類似資料:

1 国際会議録 Influence of writing strategy on CD control for the spatial-light-modulator-based Sigma7300 DUV laser pattern generator Fosshaug, H., Askebjer, P., Karlsson, J., Bajramovic, A., Xing, K., Eklund, R., Walford, J., Ekberg, M., Hogfeldt, P., … SPIE - The International Society of Optical Engineering	7 国際会議録 Pattern accuracy and throughput optimization for an SLM-based 248-nm DUV laser mask pattern generator Sjoberg, H., Chauvet, J.-M., Harkesjo, J., Hogfeldt, P., Karawajczyk, A., Karlsson, J., Kjellberg, L., Mahlen, J., … SPIE - The International Society of Optical Engineering
2 国際会議録 Airborne molecular contamination control in the micromirror SLM-based deep ultraviolet DUV SIGMA7300 laser pattern generator Ekberg, M., Fosshaug, H.A., Ostrom, T., Bjornangen, P., Utterback, T., Skotte, P.-U., Higley, J., Ruede, D., Kishkovich, … SPIE - The International Society of Optical Engineering	8 国際会議録 Second level exposure for advanced phase shift mask applications using the SLM-based Sigma7300 DUV mask writer Ostrom, T., Beyerl, A., Sjoberg, H., Newman, T., Hogfeldt, P. SPIE - The International Society of Optical Engineering
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4 国際会議録 FEP-171 resist thickness optimization and dry etch screening on NTAR7 chrome substrates for Sigma7300 DUV laser pattern generator Karlsson, J. O., Xing, K., Bajramovic, A., Dahlberg, H., Bjornberg, C., Hogfeldt, P., Kjellberg, L., Fosshaug, H., … SPIE - The International Society of Optical Engineering	10 国際会議録 Diamond optics: fabrication and applications Nikolajeff, F.K., Karlsson, M. SPIE - The International Society of Optical Engineering
5 国際会議録 PSM alignment for Sigma7300: signal quality and resist effects from using the writing DUV laser light spatial light modulator and a CCD camera as measurement … Ostrom, T., Lindau, S., Ekberg, M., Fosshaug, H.A., Zerne, R. SPIE - The International Society of Optical Engineering	11 国際会議録 Transfer of micro-optical structures into GaAs and diamond Karlsson,M., Nikolajeff,F.K. SPIE-The International Society for Optical Engineering
6 国際会議録 Properties of a 248-nm DUV laser mask pattern generator for the 90-nm and 65-nm technology nodes Aman, J., Fosshaug, H.A., Hedqvist, T., Harkesjo, J., Hogfeldt, P., Jacobsson, M., Karawajczyk, A., Karlsson, J., … SPIE - The International Society of Optical Engineering	12 国際会議録 Some aspects on mechanisms responsible for contamination of optical components in DUV lithographic exposure tools Fosshaug, H., Ekberg, M., Kylberg, G. SPIE - The International Society of Optical Engineering

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