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Synthesis of projection lithography for low-k1 via interferometry

著者名:
Cropanese, F.C. ( Rochester Institute of Technology (USA) )
Bourov, A. ( Rochester Institute of Technology (USA) )
Fan, Y. ( Rochester Institute of Technology (USA) )
Estroff, A. ( Rochester Institute of Technology (USA) )
Zavyalova, L.V. ( Rochester Institute of Technology (USA) )
Smith, B.W. ( Rochester Institute of Technology (USA) )
さらに 1 件
掲載資料名:
Optical Microlithography XVII
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5377
発行年:
2004
開始ページ:
1836
終了ページ:
1842
総ページ数:
7
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452900 [0819452904]
言語:
英語
請求記号:
P63600/5377.3
資料種別:
国際会議録

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