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Key challenges in across-pitch 0.33-k1 trench patterning using hybrid mask

著者名:
Singh, N. ( Institute of Microelectronics (Singapore) )
Mukherjee-Roy, M. ( Institute of Microelectronics (Singapore) )
Mehta, S.S. ( Institute of Microelectronics (Singapore) )
Suda, H. ( HOYA Corp. (Japan) )
Kubota, T. ( HOYA Corp. (Japan) )
Kimura, Y. ( HOYA Corp. (Japan) )
Kinoshita, H. ( HOYA Corp. (Japan) )
さらに 2 件
掲載資料名:
Optical Microlithography XVII
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5377
発行年:
2004
開始ページ:
1334
終了ページ:
1341
総ページ数:
8
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452900 [0819452904]
言語:
英語
請求記号:
P63600/5377.3
資料種別:
国際会議録

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