The impact of MEEF through pitch for 120-nm contact holes
- 著者名:
Litt, L.C. ( Motorola (USA) ) Wu, W. ( Motorola (USA) ) Conley, W. ( Motorola (USA) ) Lucas, K.D. ( Motorola (USA) ) Roman, B.J. ( Motorola (USA) ) Montgomery, P. ( Motorola (USA) ) Kasprowicz, B.S. ( Photronics, Inc. (USA) ) Progler, C.J. ( Photronics, Inc. (USA) ) Socha, R.J. ( ASML (USA) ) Verhappen, A. ( ASML (Netherlands) ) Wampler, K.E. ( ASML (USA) ) Schaefer, E. ( ASML (USA) ) Cook, P. ( ASML (USA) ) Kuijten, J.-P. ( ASML (Netherlands) ) Pijnenburg, W. ( ASML (Netherlands) ) - 掲載資料名:
- Optical Microlithography XVII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5377
- 発行年:
- 2004
- 開始ページ:
- 1305
- 終了ページ:
- 1314
- 総ページ数:
- 10
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452900 [0819452904]
- 言語:
- 英語
- 請求記号:
- P63600/5377.2
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
7
国際会議録
Process, design, and optical proximity correction requirements for the 65-nm device generation
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
8
国際会議録
Process, design and optical proximity correction requirements for the 65nm device generation
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
12
国際会議録
Comparisons of 9% versus 6% transmission attenuated phase-shift mask for the 65-nm device mode
SPIE - The International Society of Optical Engineering |