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Extension of ArF lithography for poly gate patterning of 65-nm generation and beyond

著者名:
  • Hsu, S.-H. ( United Microelectronics Corp. (Taiwan) )
  • Fang, S.-P. ( United Microelectronics Corp. (Taiwan) )
  • Huang, I.H. ( United Microelectronics Corp. (Taiwan) )
  • Lin, B.S. ( United Microelectronics Corp. (Taiwan) )
  • Hung, K.-C. ( United Microelectronics Corp. (Taiwan) )
掲載資料名:
Optical Microlithography XVII
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5377
発行年:
2004
開始ページ:
1214
終了ページ:
1224
総ページ数:
11
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452900 [0819452904]
言語:
英語
請求記号:
P63600/5377.2
資料種別:
国際会議録

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