Critical failure ORC: application to the 90-nm and 65-nm nodes

Critical failure ORC: application to the 90-nm and 65-nm nodes

著者名:

Belledent, J. ( Philips Semiconductors (France) )

Shang, S.D. ( Mentor Graphics Corp. (USA) )

Trouiller, Y. ( LETI-CEA (France) )

Miramond, C. ( STMicroelectronics (France) )

Patterson, K. ( Motorola (France) )

Toublan, O.R. ( Mentor Graphics Corp. (France) )

Couderc, C. ( Philips Semiconductors (France) )

Sundermann, F. ( STMicroelectronics (France) )

Rody, Y.F. ( Philips Semiconductors (France) )

さらに 4 件

掲載資料名:

Optical Microlithography XVII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5377

発行年:

2004

開始ページ:

1184

終了ページ:

1197

総ページ数:

14

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452900 [0819452904]

言語:

英語

請求記号:

P63600/5377.2

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013728
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical Microlithography
回次:	2004 : 17th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2004.02.24-2004.02.27

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