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Fulfillment of model-based OPC for contact patterns in 60-nm level logic device

著者名:
Kim, S.-W. ( Samsung Electronics Co., Ltd. (South Korea) )
Lee, S.-W. ( Samsung Electronics Co., Ltd. (South Korea) )
Park, C.-M. ( Samsung Electronics Co., Ltd. (South Korea) )
Choi, S.-H. ( Samsung Electronics Co., Ltd. (South Korea) )
Lee, Y.-M. ( Samsung Electronics Co., Ltd. (South Korea) )
Kang, Y. ( Samsung Electronics Co., Ltd. (South Korea) )
Yeo, G.-S. ( Samsung Electronics Co., Ltd. (South Korea) )
Lee, J.-H. ( Samsung Electronics Co., Ltd. (South Korea) )
Cho, H.-K. ( Samsung Electronics Co., Ltd. (South Korea) )
Han, W.-S. ( Samsung Electronics Co., Ltd. (South Korea) )
さらに 5 件
掲載資料名:
Optical Microlithography XVII
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5377
発行年:
2004
開始ページ:
1157
終了ページ:
1164
総ページ数:
8
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452900 [0819452904]
言語:
英語
請求記号:
P63600/5377.2
資料種別:
国際会議録

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