Correlating reticle pinhole defects to wafer printability for the 90-nm node lithography using advanced RET
- 著者名:
Shieh, W.B. ( United Microelectronics Corp. (Taiwan) ) Chou, W. ( United Microelectronics Corp. (Taiwan) ) Yang, C.-H. ( United Microelectronics Corp. (Taiwan) ) Wu, J.K. ( United Microelectronics Corp. (Taiwan) ) Chen, N. ( United Microelectronics Corp. (Taiwan) ) Yen, S.M. ( United Microelectronics Corp. (Taiwan) ) Hsu, T. ( Toppan Chunghwa Electronics Co., Ltd. (Taiwan) ) Tuan, S. ( Toppan Chunghwa Electronics Co., Ltd. (Taiwan) ) Chang, D. ( Toppan Chunghwa Electronics Co., Ltd. (Taiwan) ) Rudzinski, M.W. ( KLA-Tencor Corp. (USA) ) Wang, L. ( KLA-Tencor Corp. (USA) ) Son, K. ( KLA-Tencor Corp. (USA) ) - 掲載資料名:
- Optical Microlithography XVII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5377
- 発行年:
- 2004
- 開始ページ:
- 1047
- 終了ページ:
- 1058
- 総ページ数:
- 12
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452900 [0819452904]
- 言語:
- 英語
- 請求記号:
- P63600/5377.2
- 資料種別:
- 国際会議録
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