Defect printability in CPL mask technology

Defect printability in CPL mask technology

著者名:

Kuijten, J.-P. ( ASML (Netherlands) )

Verhappen, A. ( ASML (Netherlands) )

Pijnenburg, W. ( ASML (Netherlands) )

Conley, W. ( Motorola (USA) )

Litt, L.C. ( Motorola (USA) )

Wu, W. ( Motorola (USA) )

Montgomery, P. ( Motorola (USA) )

Roman, B.J. ( Motorola (USA) )

Kasprowicz, B.S. ( Photronics, Inc. (USA) )

Progler, C.J. ( Photronics, Inc. (USA) )

Socha, R.J. ( ASML (USA) )

Van Den Broeke, D.J. ( ASML (USA) )

Schaefer, E. ( ASML (USA) )

Cook, P. ( ASML (USA) )

さらに 9 件

掲載資料名:

Optical Microlithography XVII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5377

発行年:

2004

開始ページ:

1032

終了ページ:

1039

総ページ数:

8

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452900 [0819452904]

言語:

英語

請求記号:

P63600/5377.2

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013728
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical Microlithography
回次:	2004 : 17th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2004.02.24-2004.02.27

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2 国際会議録 The impact of MEEF through pitch for 120-nm contact holes Litt, L.C., Wu, W., Conley, W., Lucas, K.D., Roman, B.J., Montgomery, P., Kasprowicz, B.S., Progler, C.J., Socha, R.J., … SPIE - The International Society of Optical Engineering	8 国際会議録 Process, design, and optical proximity correction requirements for the 65-nm device generation Lucas, K., Montgomery, P., Litt, L.C., Conley, W., Postnikov, S.V., Wu, W., Yuan, C.-M., Olivares, M., Strozewski, K., … SPIE-The International Society for Optical Engineering
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