Through pitch intensity balancing and phase error analysis of 193-nm alternating phase shift masks
- 著者名:
- Nakagawa, K.H. ( DuPont Photomasks, Inc. (USA) )
- Hughes, G.P. ( DuPont Photomasks, Inc. (USA) )
- Park, K. ( DuPont Photomasks, Inc. (USA) )
- Buck, P. ( DuPont Photomasks, Inc. (USA) )
- 掲載資料名:
- Optical Microlithography XVII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5377
- 発行年:
- 2004
- 開始ページ:
- 1025
- 終了ページ:
- 1031
- 総ページ数:
- 7
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452900 [0819452904]
- 言語:
- 英語
- 請求記号:
- P63600/5377.2
- 資料種別:
- 国際会議録
類似資料:
1
国際会議録
Effect of quartz phase etch on 193-nm alternating phase-shift mask performance for the 100- nm node
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |