Double exposure to reduce overall line-width variation of 80-nm DRAM gate
- 著者名:
Ma, W.-K. ( Hynix Semiconductor Inc. (South Korea) ) Lim, C.-M. ( Hynix Semiconductor Inc. (South Korea) ) Oh, S.-Y. ( Hynix Semiconductor Inc. (South Korea) ) Nam, B.-H. ( Hynix Semiconductor Inc. (South Korea) ) Moon, S.-C. ( Hynix Semiconductor Inc. (South Korea) ) Shin, K.S. ( Hynix Semiconductor Inc. (South Korea) ) - 掲載資料名:
- Optical Microlithography XVII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5377
- 発行年:
- 2004
- 開始ページ:
- 939
- 終了ページ:
- 946
- 総ページ数:
- 8
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452900 [0819452904]
- 言語:
- 英語
- 請求記号:
- P63600/5377.2
- 資料種別:
- 国際会議録
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