Specification of the phase angle of a 6% attenuated PSM mask used in ArF lithography
- 著者名:
- Chang, C.H. ( United Microelectronics Corp. (Taiwan) )
- Schacht, J. ( Infineon Technologies AG (Germany) )
- Lin, B.S.-M ( United Microelectronics Corp. (Taiwan) )
- Hung, K.C. ( United Microelectronics Corp. (Taiwan) )
- Huang, I.H. ( United Microelectronics Corp. (Taiwan) )
- 掲載資料名:
- Optical Microlithography XVII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5377
- 発行年:
- 2004
- 開始ページ:
- 902
- 終了ページ:
- 910
- 総ページ数:
- 9
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452900 [0819452904]
- 言語:
- 英語
- 請求記号:
- P63600/5377.2
- 資料種別:
- 国際会議録
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