Customized illumination schemes for critical layers of 90-nm node dense memory devices in ArF lithography: comparison between simulation and experimental results

Customized illumination schemes for critical layers of 90-nm node dense memory devices in ArF lithography: comparison between simulation and experimental results

著者名:

Capetti, G. ( STMicroelectronics (Italy) )

Bollin, M. ( STMicroelectronics (Italy) )

Pepe, A. ( STMicroelectronics (Italy) )

Cotti, G. ( STMicroelectronics (Italy) )

Loi, S. ( STMicroelectronics (Italy) )

Iessi, U. ( STMicroelectronics (Italy) )

さらに 1 件

掲載資料名:

Optical Microlithography XVII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5377

発行年:

2004

開始ページ:

881

終了ページ:

893

総ページ数:

13

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452900 [0819452904]

言語:

英語

請求記号:

P63600/5377.2

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013728
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical Microlithography
回次:	2004 : 17th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2004.02.24-2004.02.27

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