Optical lithography with 157-nm technology
- 著者名:
Modderman, T.M. ( ASML (Netherlands) ) Jasper, H. ( ASML (Netherlands) ) Boom, H. ( ASML (Netherlands) ) Uitterdijk, T. ( ASML (Netherlands) ) Dana, S. ( ASML (Netherlands) ) Sewell, H. ( ASML (USA) ) O'Neil, T.K. ( ASML (USA) ) Mulkens, J. ( ASML (Netherlands) ) Brunotte, M. ( Carl Zeiss (Germany) ) Mecking, B. ( Carl Zeiss (Germany) ) Gruner, T. ( Carl Zeiss (Germany) ) - 掲載資料名:
- Optical Microlithography XVII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5377
- 発行年:
- 2004
- 開始ページ:
- 816
- 終了ページ:
- 826
- 総ページ数:
- 11
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452900 [0819452904]
- 言語:
- 英語
- 請求記号:
- P63600/5377.2
- 資料種別:
- 国際会議録
類似資料:
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |