Advanced model formulations for optical and process proximity correction

Advanced model formulations for optical and process proximity correction

著者名:

Beale, D.F. ( Synopsys, Inc. (USA) )
Shiely, J.P. ( Synopsys, Inc. (USA) )
Melvin, L.L., III ( Synopsys, Inc. (USA) )
Rieger, M.L. ( Synopsys, Inc. (USA) )

掲載資料名:

Optical Microlithography XVII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5377

発行年:

2004

開始ページ:

721

終了ページ:

729

総ページ数:

9

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452900 [0819452904]

言語:

英語

請求記号:

P63600/5377.2

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013728
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical Microlithography
回次:	2004 : 17th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2004.02.24-2004.02.27

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