Calibration of OPC models for multiple focus conditions

Calibration of OPC models for multiple focus conditions

著者名:

Schacht, J. ( Infineon Technologies (Taiwan) )

Herold, K. ( Infineon Technologies (Taiwan) )

Zimmermann, R. ( Infineon Technologies (Taiwan) )

Torres, J.A. ( Mentor Graphics Corp. (USA) )

Maurer, W. ( Mentor Graphics Corp. (USA) )

Granik, Y. ( Mentor Graphics Corp. (USA) )

Chang, C.-H. ( United Microelectronics Corp. (Taiwan) )

Hung, G.K.-C. ( United Microelectronics Corp. (Taiwan) )

Lin, B.S.-M. ( United Microelectronics Corp. (Taiwan) )

さらに 4 件

掲載資料名:

Optical Microlithography XVII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5377

発行年:

2004

開始ページ:

691

終了ページ:

702

総ページ数:

12

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452900 [0819452904]

言語:

英語

請求記号:

P63600/5377.2

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013728
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical Microlithography
回次:	2004 : 17th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2004.02.24-2004.02.27

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