The application of CPL reticle technology for the 0.045-mm node
- 著者名:
Conley, W. ( Motorola (USA) ) Van Den Broeke, D.J. ( ASML (USA) ) Socha, R.J. ( ASML (USA) ) Wu, W. ( Motorola (USA) ) Litt, L.C. ( Motorola (USA) ) Lucas, K.D. ( Motorola (USA) ) Roman, B.J. ( Motorola (USA) ) Peters, R.D. ( Motorola (USA) ) Parker, C. ( Motorola (USA) ) Chen, F. ( ASML (USA) and ASML (Netherlands) ) Wampler, K.E. ( ASML (USA) and ASML (Netherlands) ) Laidig, T.L. ( ASML (USA) and ASML (Netherlands) ) Schaefer, E. ( ASML (USA) and ASML (Netherlands) ) Kuijten, J.-P. ( ASML (USA) and ASML (Netherlands) ) Verhappen, A. ( ASML (USA) and ASML (Netherlands) ) van de Goor, S. ( ASML (USA) and ASML (Netherlands) ) Chaplin, M. ( ASML (USA) and ASML (Netherlands) ) Kasprowicz, B.S. ( Photronics, Inc. (USA) ) Progler, C.J. ( Photronics, Inc. (USA) ) Robert, E. ( STMicroelectronics (France) ) Thony, P. ( STMicroelectronics (France) ) - 掲載資料名:
- Optical Microlithography XVII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5377
- 発行年:
- 2004
- 開始ページ:
- 504
- 終了ページ:
- 509
- 総ページ数:
- 6
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452900 [0819452904]
- 言語:
- 英語
- 請求記号:
- P63600/5377.1
- 資料種別:
- 国際会議録
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Process, design, and optical proximity correction requirements for the 65-nm device generation
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