Extending optical lithography with immersion

Extending optical lithography with immersion

著者名:

Streefkerk, B. ( ASML (Netherlands) )

Baselmans, J. ( ASML (Netherlands) )

Gehoel-van Ansem, W. ( ASML (Netherlands) )

Mulkens, J. ( ASML (Netherlands) )

Hoogendam, C. ( ASML (Netherlands) )

Hoogendorp, M. ( ASML (Netherlands) )

Flagello, D.G. ( ASML (USA) )

Sewell, H. ( ASML (USA) )

Graupner, P. ( Carl Zeiss (Germany) )

さらに 4 件

掲載資料名:

Optical Microlithography XVII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5377

発行年:

2004

開始ページ:

285

終了ページ:

305

総ページ数:

21

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452900 [0819452904]

言語:

英語

請求記号:

P63600/5377.1

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013727
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical Microlithography
回次:	2004 : 17th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2004.02.24-2004.02.27

類似資料:

1 国際会議録 Advanced technology for extending optical lithography Wagner,C., Kaiser,W.M., Mulkens,I., Flagello,D.G. SPIE - The International Society for Optical Engineering	7 国際会議録 Ring-test aberration determination and device lithography correlation Garza,C.M., Conley,W., Roman,B.J., Schippers,M., Foster,J., Baselmans,J., Cummings,K.D., Flagello,D.G. SPIE-The International Society for Optical Engineering
2 国際会議録 The next phase for immersion lithography [6154-06] Sewell, H., Mulkens, J., McCafferty, D., Markoya, L., Streefkerk, B., Graeupner, P. SPIE - The International Society of Optical Engineering	8 国際会議録 Optical lithography in the sub-50-nm regime Flagello, D.G., Arnold, B., Hansen, S., Dusa, M., Socha, R.J., Mulkens, J., Garreis, R. SPIE - The International Society of Optical Engineering
3 国際会議録 Optical lithography into the millennium:sensitivity to aberrations,vibration,and polarization Flagello,D.G., Mulkens,I., Wagner,C. SPIE - The International Society for Optical Engineering	9 国際会議録 Immersion lithography exposure systems: today's capabilities and tomorrow's expectations Jan Mulkens, Bob Streefkerk, Martin Hoogendorp, Richard Moerman, Martijn Leenders, Fred de Jong, Marco Stavenga, Herman … SPIE - The International Society of Optical Engineering
4 国際会議録 High-n immersion lithography H. Sewell, J. Mulkens, P. Graeupner, D. McCafferty, L. Markoya Society of Photo-optical Instrumentation Engineers	10 国際会議録 Optimizing and enhancing optical systems to meet the low k1 challenge Flagello, D.G., Socha, R.J., Shi, X., Schoot, J.B., Baselmans, J., Kerkhof, M.A., Boeij, W., Engelen, A., Carpaij, R., … SPIE-The International Society for Optical Engineering
5 国際会議録 ArF immersion lithography using TWINSCAN technology Mulkens, J., Streefkerk, B., Haagendorp, M. SPIE - The International Society of Optical Engineering	11 国際会議録 Defects, overlay, and focus performance improvements with five generations of immersion exposure systems J. Mulkens, B. Streefkerk, H. Jasper, J. de Klerk, F. de Jong, L. Levasier, M. Leenders SPIE - The International Society of Optical Engineering
6 国際会議録 Extending immersion lithography with high-index materials: results of a feasibility study H. Sewell, J. Mulkens, P. Graeupner, D. McCafferty, L. Markoya, S. Donders, N. Samarakone, R. Duesing SPIE - The International Society of Optical Engineering	12 国際会議録 Immersion lithography with an ultrahigh-NA in-line catadioptric lens and a high-transmission flexible polarization illumination system [6154-69] Jasper, H., Modderman, T., Van de Kerkhof, M., Wagner, C., Mulkens, J., De. Bodij, W., Van Seten, E, Kneer, B. SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12