Contact hole formation by multiple exposure technique in ultralow-k1 lithography
- 著者名:
Nakamura, H. ( Toshiba Corp. (Japan) ) Onishi, Y. ( Toshiba Corp. (Japan) ) Sato, K. ( Toshiba Corp. (Japan) ) Tanaka, S. ( Toshiba Corp. (Japan) ) Mimotogi, S. ( Toshiba Corp. (Japan) ) Hashimoto, K. ( Toshiba Corp. (Japan) ) Inoue, S. ( Toshiba Corp. (Japan) ) - 掲載資料名:
- Optical Microlithography XVII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5377
- 発行年:
- 2004
- 開始ページ:
- 255
- 終了ページ:
- 263
- 総ページ数:
- 9
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452900 [0819452904]
- 言語:
- 英語
- 請求記号:
- P63600/5377.1
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
10
国際会議録
Contact hole photo process improvement by multiple exposures with matched illumination settings
SPIE-The International Society for Optical Engineering |
5
国際会議録
Prediction of imaging performance of immersion lithography using high refractive index fluid
Society of Photo-optical Instrumentation Engineers |
11
国際会議録
Evaluation of lithography simulation model accuracy for hotspot-based mask quality assurance
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |