Study of OPC for AAPSM reticles using various mask fabrication techniques
- 著者名:
Hughes, G.P. ( DuPont Photomasks, Inc. (USA) ) Kamaruddin, D. ( Motorola (USA) ) Nakagawa, K.H. ( DuPont Photomask, Inc. (USA) ) MacDonald, S. ( DuPont Photomask, Inc. (USA) ) Wilkinson, B. ( Motorola (USA) ) West, C. ( DuPont Photomasks, Inc. (USA) ) Park, K. ( DuPont Photomasks, Inc. (USA) ) - 掲載資料名:
- Optical Microlithography XVII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5377
- 発行年:
- 2004
- 開始ページ:
- 204
- 終了ページ:
- 211
- 総ページ数:
- 8
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452900 [0819452904]
- 言語:
- 英語
- 請求記号:
- P63600/5377.1
- 資料種別:
- 国際会議録
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