Optical lithography in the sub-50-nm regime
- 著者名:
Flagello, D.G. ( ASML (USA) ) Arnold, B. ( ASML (USA) ) Hansen, S. ( ASML (USA) ) Dusa, M. ( ASML (USA) ) Socha, R.J. ( ASML (USA) ) Mulkens, J. ( ASML (Netherlands) ) Garreis, R. ( Carl Zeiss (Germany) ) - 掲載資料名:
- Optical Microlithography XVII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5377
- 発行年:
- 2004
- 開始ページ:
- 21
- 終了ページ:
- 33
- 総ページ数:
- 13
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452900 [0819452904]
- 言語:
- 英語
- 請求記号:
- P63600/5377.1
- 資料種別:
- 国際会議録
類似資料:
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SPIE - The International Society for Optical Engineering |
4
国際会議録
Optical lithography into the millennium:sensitivity to aberrations,vibration,and polarization
SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |