PEB sensitivity studies of ArF resists: II. Polymer and solvent effects
- 著者名:
Hong, C.-S. ( Clariant Corp. (USA) ) Lee, S.-H. ( Clariant Corp. (USA) ) Kim, W.-K. ( Clariant Corp. (USA) ) Kudo, T. ( Clariant Corp. (USA) ) Timko, A. ( Clariant Corp. (USA) ) Mckenzie, D. ( Clariant Corp. (USA) ) Anyadiegwu, C. ( Clariant Corp. (USA) ) Rahman, D.M. ( Clariant Corp. (USA) ) Lin, G. ( Clariant Corp. (USA) ) Dammel, R.R. ( Clariant Corp. (USA) ) Padmanaban, M. ( Clariant Corp. (USA) ) - 掲載資料名:
- Advances in Resist Technology and Processing XXI
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5376
- 発行年:
- 2004
- 開始ページ:
- 1131
- 終了ページ:
- 1137
- 総ページ数:
- 7
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452894 [0819452890]
- 言語:
- 英語
- 請求記号:
- P63600/5376.2
- 資料種別:
- 国際会議録
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SPIE-The International Society for Optical Engineering |
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SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |