Novel transparent PAGs for 193-nm resists

Novel transparent PAGs for 193-nm resists

著者名:

Kodama, K. ( Fuji Photo Film Co., Ltd. (Japan) )

Sato, K. ( Fuji Photo Film Co., Ltd. (Japan) )

Tan, S. ( Fuji Photo Film Co., Ltd. (Japan) )

Nishiyama, F. ( Fuji Photo Film Co., Ltd. (Japan) )

Yamanaka, T. ( Fuji Photo Film Co., Ltd. (Japan) )

Kanna, S. ( Fuji Photo Film Co., Ltd. (Japan) )

Takahashi, H. ( Fuji Photo Film Co., Ltd. (Japan) )

Kawabe, Y. ( Fuji Photo Film Co., Ltd. (Japan) )

Momota, M. ( FUJIFILM Arch Co., Ltd. (Japan) )

Kokubo, T. ( FUJIFILM Arch Co., Ltd. (Japan) )

さらに 5 件

掲載資料名:

Advances in Resist Technology and Processing XXI

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5376

発行年:

2004

開始ページ:

1107

終了ページ:

1114

総ページ数:

8

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452894 [0819452890]

言語:

英語

請求記号:

P63600/5376.2

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013726
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Advances in resist technology and processing
回次:	2004 : 21st
会議開催地:	Santa Clara, CA, USA
会議開催年:	2004.02.23-2004.02.24

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