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Realization of sub-80-nm small-space patterning in ArF photolithography

著者名:
Kim, S.-H. ( Samsung Electronics Co., Ltd. (South Korea) )
Kim, H.-D. ( Samsung Electronics Co., Ltd. (South Korea) )
Lee, S.-H. ( Samsung Electronics Co., Ltd. (South Korea) )
Park, C.-M. ( Samsung Electronics Co., Ltd. (South Korea) )
Ryoo, M.-H. ( Samsung Electronics Co., Ltd. (South Korea) )
Yeo, G.-S. ( Samsung Electronics Co., Ltd. (South Korea) )
Lee, J.-H. ( Samsung Electronics Co., Ltd. (South Korea) )
Cho, H.-K. ( Samsung Electronics Co., Ltd. (South Korea) )
Han, W.-S. ( Samsung Electronics Co., Ltd. (South Korea) )
Moon, J.-T. ( Samsung Electronics Co., Ltd. (South Korea) )
さらに 5 件
掲載資料名:
Advances in Resist Technology and Processing XXI
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5376
発行年:
2004
開始ページ:
1082
終了ページ:
1090
総ページ数:
9
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452894 [0819452890]
言語:
英語
請求記号:
P63600/5376.2
資料種別:
国際会議録

類似資料:

1 国際会議録 Adaptability and validity of thin organic bottom anti-reflective coating (BARC) to sub-90-nm patterning in ArF lithography

Kim, S.-H., Lee, S.-H., Yeo, G.-S., Lee, J.H., Cho, H.-K., Han, W.-S., Moon, J.-T.

SPIE-The International Society for Optical Engineering
7 国際会議録 Performance of a SSQ-type ArF bilayer resist in 80-nm node DRAM line and space fabrication

Jung, M.-H., Kim, H.-W., Hong, J., Woo, S.-G., Cho, H.-K., Han, W.-S.

SPIE - The International Society of Optical Engineering
2 国際会議録 A simple and accurate resist parameter extraction method for sub-80-nm DRAM patterns

Lee, S., Hwang, C., Park, D.-W., Kim, I.-S., Kim, H.-C., Woo, S.-G., Cho, H.-K., Moon, J.-T.

SPIE - The International Society of Optical Engineering
8 国際会議録 Fulfillment of model-based OPC for contact patterns in 60-nm level logic device

Kim, S.-W., Lee, S.-W., Park, C.-M., Choi, S.-H., Lee, Y.-M., Kang, Y., Yeo, G.-S., Lee, J.-H., Cho, H.-K., Han, W.-S.

SPIE - The International Society of Optical Engineering
3 国際会議録 Strategy for sub-80-nm contact hole patterning considering device fabrication

Yoon, J.-Y., Hata, M., Hah, J.-H., Kim, H.-W., Woo, S.-G., Cho, H.-K., Han, W.-S.

SPIE - The International Society of Optical Engineering
9 国際会議録 Validation of ArF chromeless PSM in the sub-100-nm node DRAM cell

Lee, J.-H., Chung, D.-H., Cha, D.-C., Kim, H.-S., Park, J.-S., Nam, D.-G., Woo, S.-K., Cho, H.-S., Han, W.-S.

SPIE-The International Society for Optical Engineering
4 国際会議録 Challenge for effective OCV control in 90-nm logic gate using ArF lithography

Kang, H.-J., Lee, S.-W., Lee, D.-Y., Yeo, G.-S., Lee, J.-H., Cho, H.-K., Han, W.-S., Moon, J.-T.

SPIE-The International Society for Optical Engineering
10 国際会議録 Comparison of ArF bilayer resists for sub-90 nm L/S fabrication

Hong, J., Kim, H.-W., Lee, S.-H., Woo, S.-G., Cho, H.-K., Han, W.-S.

SPIE-The International Society for Optical Engineering
5 国際会議録 Advanced module-based approach to effective CD prediction of sub-100nm patterns

Shin, J., Kim, I., Hwang, C., Park, D.-W., Woo, S.-G., Cho, H.-K., Han, W.-S., Moon, J.-T.

SPIE - The International Society of Optical Engineering
11 国際会議録 Improvement of pattern collapse in sub-100 nm nodes

Jung, M.-H., Lee, S.-H., Kim, H.-W., Woo, S.-G., Cho, H.-K., Han, W.-S.

SPIE-The International Society for Optical Engineering
6 国際会議録 ArF issues of 90-nm-node DRAM device integration

Goo, D.-H., Kim, B.-S., Park, J.-S., Yoon, K.-S., Lee, J.-H., Cho, H.-K., Han, W.-S., Moon, J.-T.

SPIE-The International Society for Optical Engineering
12 国際会議録 Evaluation of ArF CLM in the sub-100-nm DRAM cell

Lee, J.-H., Chung, D.-H., Kim, H.-C., Nam, D.-S., Woo, S.-G., Cho, H.-K., Han, W.-S.

SPIE-The International Society for Optical Engineering
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