Airborne contamination control for 157-nm lithography: influence of ammonia contamination

Airborne contamination control for 157-nm lithography: influence of ammonia contamination

著者名:

Matsui, H. ( Tokyo Electron AT Ltd. (Japan) )

Kitano, J. ( Tokyo Electron Kyushu Ltd. (Japan) )

Yoshihara, K. ( Tokyo Electron Kyushu Ltd. (Japan) )

Kawaguchi, E. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Furukawa, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Matsunaga, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Itani, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Fujii, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

さらに 3 件

掲載資料名:

Advances in Resist Technology and Processing XXI

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5376

発行年:

2004

開始ページ:

1074

終了ページ:

1081

総ページ数:

8

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452894 [0819452890]

言語:

英語

請求記号:

P63600/5376.2

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013726
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Advances in resist technology and processing
回次:	2004 : 21st
会議開催地:	Santa Clara, CA, USA
会議開催年:	2004.02.23-2004.02.24

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1 国際会議録 Critical dimension (CD) control in 157-nm lithography Hori, S., Yoshihara, K., Kyoda, H., Matsui, H., Furukawa, T., Miyoshi, S., Kawaguchi, E., Itani, T. SPIE-The International Society for Optical Engineering	7 国際会議録 157-nm lithography for 65-nm node SRAM-gate Suganaga, T., Irie, S., Miyoshi, S., Kim, J.-H., Watanabe, K., Kurose, E., Furukawa, T., Hagiwara, T., Ishimaru, T., … SPIE-The International Society for Optical Engineering
2 国際会議録 Advances in resist pattern transfer process using 157-nm lithography Furukawa, T., Hagiwara, T., Kawaguchi, E., Matsunaga, K., Suganaga, T., Itani, T., Fujii, K. SPIE - The International Society of Optical Engineering	8 国際会議録 157-nm bilayer resist: patterning and etching performance Miyoshi, S., Furukawa, T., Kawaguchi, E., Itani, T. SPIE-The International Society for Optical Engineering
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