Advances in resist pattern transfer process using 157-nm lithography

Advances in resist pattern transfer process using 157-nm lithography

著者名:

Furukawa, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Hagiwara, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Kawaguchi, E. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Matsunaga, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Suganaga, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Itani, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Fujii, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

さらに 2 件

掲載資料名:

Advances in Resist Technology and Processing XXI

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5376

発行年:

2004

開始ページ:

1064

終了ページ:

1073

総ページ数:

10

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452894 [0819452890]

言語:

英語

請求記号:

P63600/5376.2

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013726
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Advances in resist technology and processing
回次:	2004 : 21st
会議開催地:	Santa Clara, CA, USA
会議開催年:	2004.02.23-2004.02.24

類似資料:

1 国際会議録 157-nm chromeless phase lithography for 45-nm SRAM gate Suganaga, T., Watanabe, K., Matsuura, S., Hagiwara, T., Furukawa, T., Itani, T., Fujii, K. SPIE - The International Society of Optical Engineering	7 国際会議録 Characterization of TFE/norbornene-based fluoropolymer resist for 157-nm lithography Hagiwara, T., Furukawa, T., Itani, T., Fujii, K., Ishikawa, T., Koh, M., Kodani, T., Moriya, T., Yamashita, T., Araki, … SPIE - The International Society of Optical Engineering
2 国際会議録 Airborne contamination control for 157-nm lithography: influence of ammonia contamination Matsui, H., Kitano, J., Yoshihara, K., Kawaguchi, E., Furukawa, T., Matsunaga, K., Itani, T., Fujii, K. SPIE - The International Society of Optical Engineering	8 国際会議録 Sub-70-nm pattern fabrication using an alternating phase-shifting mask in 157-nm lithography Irie, S., Kanda, N., Watanabe, K., Suganaga, T., Itani, T. SPIE-The International Society for Optical Engineering
3 国際会議録 157-nm bilayer resist: patterning and etching performance Miyoshi, S., Furukawa, T., Kawaguchi, E., Itani, T. SPIE-The International Society for Optical Engineering	9 国際会議録 Feasibility study of defects in 157-nm resist process Wakamizu, S., Kiba, Y., Kawaguchi, E., Miyoshi, S., Furukawa, T., Itani, T. SPIE-The International Society for Optical Engineering
4 国際会議録 157-nm chromeless phase lithography with extremely high numerical aperture Watanabe, K., Hagiwara, T., Matsuura, S., Suganaga, T., Itani, T., Fujii, K. SPIE - The International Society of Optical Engineering	10 国際会議録 Optimization of the chromium-shielding attenuated phase shift mask for 157-nm lithography Kurose, E., Watanabe, K., Suganaga, T., Itani, T., Fujii, K. SPIE - The International Society of Optical Engineering
5 国際会議録 Pattern transfer processes for 157-nm lithography Miyoshi, S., Furukawa, T., Watanabe, H., Irie, S., Itani, T. SPIE-The International Society for Optical Engineering	11 国際会議録 157-nm lithography with extremely high numerical aperture lens for 45-nm technology node Suganaga, T., Lee, J.-W., Kurose, E., Ishimaru, T., Furukawa, T., Itani, T., Fujii, K., Cashmore, J.S., Gower, M. SPIE - The International Society of Optical Engineering
6 国際会議録 157-nm lithography for 65-nm node SRAM-gate Suganaga, T., Irie, S., Miyoshi, S., Kim, J.-H., Watanabe, K., Kurose, E., Furukawa, T., Hagiwara, T., Ishimaru, T., … SPIE-The International Society for Optical Engineering	12 国際会議録 157-nm resist assessment by a full-field scanner Otoguro, A., Irie, S., Ishimaru, T., Suganaga, T., Itani, T., Fujii, K. SPIE - The International Society of Optical Engineering

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