Improved performance of Apex-E photoresist with the application of the electric-field-enhanced PEB

Improved performance of Apex-E photoresist with the application of the electric-field-enhanced PEB

著者名:

Poppe, J. ( Univ. of California/Berkeley (USA) )
Neureuther, A.R. ( Univ. of California/Berkeley (USA) )

掲載資料名:

Advances in Resist Technology and Processing XXI

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5376

発行年:

2004

開始ページ:

1017

終了ページ:

1022

総ページ数:

6

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452894 [0819452890]

言語:

英語

請求記号:

P63600/5376.2

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013726
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Advances in resist technology and processing
回次:	2004 : 21st
会議開催地:	Santa Clara, CA, USA
会議開催年:	2004.02.23-2004.02.24

類似資料:

1 国際会議録 Verification of a high-resolution PEB parameter extraction methodology based on double exposure technique Yuan, L., Neureuther, A.R. SPIE-The International Society for Optical Engineering	7 国際会議録 Performance of repaired defects and attPSM in EUV multilayer masks Deng, Y., La Fontaine, B., Neureuther, A.R. SPIE-The International Society for Optical Engineering
2 国際会議録 Images in photoresist for self-interferometric electrical image monitors J. Rubinstein, A. R. Neureuther Society of Photo-optical Instrumentation Engineers	8 国際会議録 Initial experimental verification: characterizing tool illumination and PSM performance with phase-shifting masks McIntyre, G.R., Neureuther, A.R. SPIE - The International Society of Optical Engineering
3 国際会議録 Improving chemically amplified resist modeling for 2D layout patterns Yuan, L., Neureuther, A.R. SPIE-The International Society for Optical Engineering	9 国際会議録 Platform for collaborative DFM [6156-13] Poppe, W. J., Capodieci, L., Neureuther, A. SPIE - The International Society of Optical Engineering
4 国際会議録 Lithographic performance of advanced thin resists Williamson,M., Neureuther,A.R. SPIE - The International Society for Optical Engineering	10 国際会議録 Database and data analysis strategy for multi-designer testchips W. J. Poppe, P. Au, D. Jayasuriya, A. Neureuther Society of Photo-optical Instrumentation Engineers
5 国際会議録 Layout ’hot spots’ for advancing optical technologies [6154-140] Holwill, J., Mcintyre, G., Poppe, W., Neureuther, A R. SPIE - The International Society of Optical Engineering	11 国際会議録 Role of illumination and thin film layers on the printability of defects R.J. Socha, A.R. Neureuther Society of Photo-optical Instrumentation Engineers
6 国際会議録 Enhanced quantitative analysis of resist image contrast upon line- edge roughness (LER) Williamson, M.V., Neureuther, A.R. SPIE-The International Society for Optical Engineering	12 国際会議録 Interferometric-probe aberration monitor performance in the production environment Robins, G.C., Neureuther, A.R., Dusa, M., Kye, J. SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12