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Surface conditioning solutions to reduce resist line roughness

著者名:
Zhang, P. ( Air Products and Chemicals, Inc. (USA) )
Jaramillo, M., Jr. ( Air Products and Chemicals, Inc. (USA) )
Rao, M.B. ( Air Products and Chemicals, Inc. (USA) )
Yates, C. ( LSI Logic Corp. (USA) )
King, D.M. ( Air Products and Chemicals, Inc. (USA) )
Ross, B.F. ( Air Products and Chemicals, Inc. (USA) )
O'Brien, B.L. ( Air Products and Chemicals, Inc. (USA) )
さらに 2 件
掲載資料名:
Advances in Resist Technology and Processing XXI
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5376
発行年:
2004
開始ページ:
801
終了ページ:
806
総ページ数:
6
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452894 [0819452890]
言語:
英語
請求記号:
P63600/5376.2
資料種別:
国際会議録

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