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Sources of line-width roughness for EUV resists

著者名:
Cao, H.B. ( Intel Corp. (USA) )
Yueh, W. ( Intel Corp. (USA) )
Rice, B.J. ( Intel Corp. (USA) )
Roberts, J. ( Intel Corp. (USA) )
Bacuita, T. ( Intel Corp. (USA) )
Chandhok, M. ( Intel Corp. (USA) )
さらに 1 件
掲載資料名:
Advances in Resist Technology and Processing XXI
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5376
発行年:
2004
開始ページ:
757
終了ページ:
764
総ページ数:
8
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452894 [0819452890]
言語:
英語
請求記号:
P63600/5376.2
資料種別:
国際会議録

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