Single-layer and bilayer resist processes for EUV-type integrations
- 著者名:
Peters, R.D. ( Motorola, Inc. (USA) ) Parker, C. ( Motorola, Inc. (USA) ) Cobb, J. ( Motorola, Inc. (USA) ) Luckowski, E. ( Motorola, Inc. (USA) ) Weisbrod, E. ( Motorola, Inc. (USA) ) Dauksher, B. ( Motorola, Inc. (USA) ) - 掲載資料名:
- Advances in Resist Technology and Processing XXI
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5376
- 発行年:
- 2004
- 開始ページ:
- 746
- 終了ページ:
- 756
- 総ページ数:
- 11
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452894 [0819452890]
- 言語:
- 英語
- 請求記号:
- P63600/5376.2
- 資料種別:
- 国際会議録
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SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |