Blank Cover Image

Analysis of solvent effect to control the BARC coating uniformity

著者名:
Jung, M.-H. ( Rohm and Haas Electronic Materials Korea Ltd. (South Korea) )
Yoon, S. ( Samsung Electronics Co., Ltd. (South Korea) )
Chung, E.-S. ( Rohm and Haas Electronic Materials Korea Ltd. (South Korea) )
Yoo, B.-S. ( Rohm and Haas Electronic Materials Korea Ltd. (South Korea) )
Ya, J.Y. ( Rohm and Haas Electronic Materials Korea Ltd. (South Korea) )
Winning, D. ( Rohm and Haas Electronic Materials (USA) )
Kim, B.D. ( Samsung Electronics Co., Ltd. (South Korea) )
Lee, H. ( Samsung Electronics Co., Ltd. (South Korea) )
Kim, D.Y. ( Samsung Electronics Co., Ltd. (South Korea) )
Kim, Y.H. ( Samsung Electronics Co., Ltd. (South Korea) )
Kim, M. ( Samsung Electronics Co., Ltd. (South Korea) )
Chon, S.-M. ( Samsung Electronics Co., Ltd. (South Korea) )
さらに 7 件
掲載資料名:
Advances in Resist Technology and Processing XXI
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5376
発行年:
2004
開始ページ:
703
終了ページ:
710
総ページ数:
8
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452894 [0819452890]
言語:
英語
請求記号:
P63600/5376.2
資料種別:
国際会議録

類似資料:

1 国際会議録 Influence of resin properties to resist performance at ArF lithography

Yoon, S., Kim, M., Lee, H., Kim, D.Y., Kim, Y.H., Kim, B.D., Kim, J.H., Kim, K.-M., Lee, S.Y., Chon, S.-M.

SPIE - The International Society of Optical Engineering
7 国際会議録 Performance analysis of ArF excimer laser lithography optics

Lee,K.H., Kim,D.H., Kim,J.S., Chung,H.B., Yoo,H.J.

SPIE-The International Society for Optical Engineering
2 国際会議録 Impact of BARC on SEM shrinkage of ArF resist

Lee, S.Y., Kim, M., Yoon, S., Kim, K.-M., Kim, J.H., Kim, H.-W., Woo, S.-G., Kim, Y.H., Chon, S.-M., Kishioka, T., Sone, …

SPIE - The International Society of Optical Engineering
8 国際会議録 Effect of Pouring Temperature and Holding Time at Semi-Solid Region on the Morphology of Primary Solid Phase in Semi-Solid Slurry

Kang, S.W., Kim, K.B., Lee, D.Y., Mun, J.H., Yoon, E.P.

Trans Tech Publications
3 国際会議録 Calculation of the Free Energy Barrier in the Freezing of Nanoclusters by Atomistic Simulations

Nam, H.-S., Hwang, N. M., Yu, B.D., Kim, D.Y., Yoon, J.-K.

Trans Tech Publications
9 国際会議録 IntenCD: an application for CD uniformity mapping of photomask and process control at maskshops

H. Kim, M. Lee, S. Lee, Y. -S. Sung, B. Kim

Society of Photo-optical Instrumentation Engineers
4 国際会議録 Synthetic Control And Properties Of Processible Poly(methylsilsesquioxane)5

Lee, J., Char, K., Kim, H., Rhee, H., Ro, H., Yoo, D., Yoon, D.Y.

Materials Research Society
10 国際会議録 Synthesis of ZnO Nanoparticles Embedded in a Polymeric Matrix; Effect of Curing Temperature

Jeon, H.J., Chung, Y., Kim, S.Y., Yoon, C.S., Kim, Y.H.

Trans Tech Publications
5 国際会議録 Thin film type 248-nm bottom antireflective coatings

Enomoto, T., Nakayama, K., Mizusawa, K., Nakajima, Y., Yoon, S., Kim, Y.-H., Chung, H., Chon, S.M.

SPIE-The International Society for Optical Engineering
11 国際会議録 Effect of thermal treatment on electrical conductivity of a polypyrrole film cast from the solution

Lee, J.Y., Kim, D.Y., Song, K.T., Kim, S.Y., Kim, C.Y.

Society of Plastics Engineers, Inc. (SPE)
6 国際会議録 Influence of activation energy on LER in chemically amplified KrF photoresists

Kim, J.H., Lee, C.H., Park, S.B., Kim, W.M., Moon, S.S., Kim, K.-M., Lee, S.Y., Yoon, S., Kim, Y.H., Chon, S.-M.

SPIE - The International Society of Optical Engineering
12 国際会議録 Gate Oxide Integrity for Polysilicon Thin-Film Transistors: A Comparative Study for ELC, MILC, and SPC Crystallized Active Polysilicon Layer

Choi, D.C., Choi, B.D., Jung, J.Y., Park, H.H., Seo, J.W., Lee, K.Y., Chung, H.K.

Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12