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PEB sensitivity variation of 193-nm resist according to activation energy of protection groups

著者名:
Oh, S.K. ( Dongjin Semichem Co., Ltd. (South Korea) )
Kim, J.Y. ( Dongjin Semichem Co., Ltd. (South Korea) )
Lee, J.W. ( Dongjin Semichem Co., Ltd. (South Korea) )
Kim, D. ( Dongjin Semichem Co., Ltd. (South Korea) )
Kim, J. ( Dongjin Semichem Co., Ltd. (South Korea) )
Lee, G. ( Hynix Semiconductor Inc. (South Korea) )
Jung, J.C. ( Hynix Semiconductor Inc. (South Korea) )
Bok, C.K. ( Hynix Semiconductor Inc. (South Korea) )
Shin, K.S. ( Hynix Semiconductor Inc. (South Korea) )
さらに 4 件
掲載資料名:
Advances in Resist Technology and Processing XXI
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5376
発行年:
2004
開始ページ:
625
終了ページ:
632
総ページ数:
8
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452894 [0819452890]
言語:
英語
請求記号:
P63600/5376.1
資料種別:
国際会議録

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