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Water-developable resists based on glyceryl methacrylate for 193-nm lithography

著者名:
  • Kim, J.-B. ( Korea Advanced Institute of Science and Technology (South Korea) )
  • Jang, J.-H. ( Korea Advanced Institute of Science and Technology (South Korea) )
  • Choi, J.-H. ( Korea Advanced Institute of Science and Technology (South Korea) )
  • Lee, K.-K. ( Korea Advanced Institute of Science and Technology (South Korea) )
  • Ko, J.-S. ( Korea Advanced Institute of Science and Technology (South Korea) )
掲載資料名:
Advances in Resist Technology and Processing XXI
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5376
発行年:
2004
開始ページ:
616
終了ページ:
624
総ページ数:
9
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452894 [0819452890]
言語:
英語
請求記号:
P63600/5376.1
資料種別:
国際会議録

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