Investigation of the effect of resist components and process condition on photochemical efficiency of ArF photoresist
- 著者名:
Kim, J.-W. ( Dongjin Semichem Co., Ltd. (South Korea) ) Son, E.-K. ( Dongjin Semichem Co., Ltd. (South Korea) ) Lee, S.-H. ( Dongjin Semichem Co., Ltd. (USA) ) Kim, D. ( Dongjin Semichem Co., Ltd. (South Korea) ) Kim, J. ( Dongjin Semichem Co., Ltd. (South Korea) ) Lee, G. ( Hynix Semiconductor Inc. (South Korea) ) Jung, J.C. ( Hynix Semiconductor Inc. (USA) ) Bok, C.K. ( Hynix Semiconductor Inc. (South Korea) ) Moon, S.C. ( Hynix Semiconductor Inc. (USA) ) Shin, K.S. ( Hynix Semiconductor Inc. (South Korea) ) - 掲載資料名:
- Advances in Resist Technology and Processing XXI
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5376
- 発行年:
- 2004
- 開始ページ:
- 599
- 終了ページ:
- 607
- 総ページ数:
- 9
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452894 [0819452890]
- 言語:
- 英語
- 請求記号:
- P63600/5376.1
- 資料種別:
- 国際会議録
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