Impact of BARC on SEM shrinkage of ArF resist

Impact of BARC on SEM shrinkage of ArF resist

著者名:

Lee, S.Y. ( Samsung Electronics Co., Ltd. (South Korea) )

Kim, M. ( Samsung Electronics Co., Ltd. (South Korea) )

Yoon, S. ( Samsung Electronics Co., Ltd. (South Korea) )

Kim, K.-M. ( Samsung Electronics Co., Ltd. (South Korea) )

Kim, J.H. ( Samsung Electronics Co., Ltd. (South Korea) )

Kim, H.-W. ( Samsung Electronics Co., Ltd. (South Korea) )

Woo, S.-G. ( Samsung Electronics Co., Ltd. (South Korea) )

Kim, Y.H. ( Samsung Electronics Co., Ltd. (South Korea) )

Chon, S.-M. ( Samsung Electronics Co., Ltd. (South Korea) )

Kishioka, T. ( Nissan Chemical Industries, Ltd. (Japan) )

Sone, Y. ( Nissan Chemical Industries, Ltd. (Japan) )

Nakajima, Y. ( Nissan Chemical Industries, Ltd. (Japan) )

さらに 7 件

掲載資料名:

Advances in Resist Technology and Processing XXI

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5376

発行年:

2004

開始ページ:

575

終了ページ:

582

総ページ数:

8

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452894 [0819452890]

言語:

英語

請求記号:

P63600/5376.1

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013725
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Advances in resist technology and processing
回次:	2004 : 21st
会議開催地:	Santa Clara, CA, USA
会議開催年:	2004.02.23-2004.02.24

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2 国際会議録 Comprehensive analysis of sources of total CD variation in ArF resist perspective Kim, H.-W., Lee, H.-R., Kim, K.-M., Lee, S.Y., Kim, B.-C., Oh, S.-H., Woo, S.-G., Cho, H.-K., Han, W.-S. SPIE - The International Society of Optical Engineering	8 国際会議録 Most feasible curing process for ArF resists in device integration aspect Kim, H.-W., Kang, Y., Lee, J.-H., Chae, Y.-S., Woo, S.-G., Cho, H.-K., Han, W.-S. SPIE-The International Society for Optical Engineering
3 国際会議録 New polymer platform of BARC for ArF lithography Yoshiomi Hiroi, Takahiro Kishioka, Rikimaru Sakamoto, Daisuke Maruyama, Yasushi Sakaida, Takashi Matsumoto, Yasuyuki … SPIE - The International Society of Optical Engineering	9 国際会議録 Comparison of ArF bilayer resists for sub-90 nm L/S fabrication Hong, J., Kim, H.-W., Lee, S.-H., Woo, S.-G., Cho, H.-K., Han, W.-S. SPIE-The International Society for Optical Engineering
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