Effect of line-edge roughness (LER) and line-width roughness (LWR) on sub-100-nm device performance
- 著者名:
Lee, J.-Y. ( Samsung Electronics Co., Ltd. (South Korea) ) Shin, J. ( Samsung Electronics Co., Ltd. (South Korea) ) Kim, H.-W. ( Samsung Electronics Co., Ltd. (South Korea) ) Woo, S.-G. ( Samsung Electronics Co., Ltd. (South Korea) ) Cho, H.-K. ( Samsung Electronics Co., Ltd. (South Korea) ) Han, W.-S. ( Samsung Electronics Co., Ltd. (South Korea) ) Moon, J.-T. ( Samsung Electronics Co., Ltd. (South Korea) ) - 掲載資料名:
- Advances in Resist Technology and Processing XXI
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5376
- 発行年:
- 2004
- 開始ページ:
- 426
- 終了ページ:
- 433
- 総ページ数:
- 8
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452894 [0819452890]
- 言語:
- 英語
- 請求記号:
- P63600/5376.1
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
8
国際会議録
Evaluation of puddle time effect and optimization of development process in 193-nm lithography
SPIE - The International Society of Optical Engineering |
3
国際会議録
Successful application of angular scatterometry to process control in sub-100-nm DRAM device
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
12
国際会議録
Improving model-based OPC performance for sub-60nm devices using real source optical model [6156-32]
SPIE - The International Society of Optical Engineering |