Evaluation of outgassing from a fluorinated resist for 157-nm lithography
- 著者名:
Irie, S. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Fujii, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Itakura, Y. ( Komatsu Ltd. (Japan) ) Kawasa, Y. ( Komatsu Ltd. (Japan) ) Egawa, K. ( Komatsu Ltd. (Japan) ) Uchino, I. ( Komatsu Ltd. (Japan) ) Sumitani, A. ( Komatsu Ltd. (Japan) ) Itani, T. ( NEC Electronics Corp. (Japan) ) - 掲載資料名:
- Advances in Resist Technology and Processing XXI
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5376
- 発行年:
- 2004
- 開始ページ:
- 226
- 終了ページ:
- 237
- 総ページ数:
- 12
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452894 [0819452890]
- 言語:
- 英語
- 請求記号:
- P63600/5376.1
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
12
国際会議録
Sub-70-nm pattern fabrication using an alternating phase-shifting mask in 157-nm lithography
SPIE-The International Society for Optical Engineering |