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Evaluation of outgassing from a fluorinated resist for 157-nm lithography

著者名:
Irie, S. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Fujii, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Itakura, Y. ( Komatsu Ltd. (Japan) )
Kawasa, Y. ( Komatsu Ltd. (Japan) )
Egawa, K. ( Komatsu Ltd. (Japan) )
Uchino, I. ( Komatsu Ltd. (Japan) )
Sumitani, A. ( Komatsu Ltd. (Japan) )
Itani, T. ( NEC Electronics Corp. (Japan) )
さらに 3 件
掲載資料名:
Advances in Resist Technology and Processing XXI
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5376
発行年:
2004
開始ページ:
226
終了ページ:
237
総ページ数:
12
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452894 [0819452890]
言語:
英語
請求記号:
P63600/5376.1
資料種別:
国際会議録

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