Overbake: sub-40-nm gate patterning with ArF lithography and binary masks
- 著者名:
- Van Steenwinckel, D. ( Philips Research Leuven (Belgium) )
- Kwinten, H. ( Philips Research Leuven (Belgium) )
- Locorotondo, S. ( IMEC (Belgium) )
- Beckx, S. ( IMEC (Belgium) )
- 掲載資料名:
- Advances in Resist Technology and Processing XXI
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5376
- 発行年:
- 2004
- 開始ページ:
- 215
- 終了ページ:
- 225
- 総ページ数:
- 11
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452894 [0819452890]
- 言語:
- 英語
- 請求記号:
- P63600/5376.1
- 資料種別:
- 国際会議録
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3
国際会議録
Sub-120-nm technology compatibility of attenuated phase-shift mask in KrF and ArF lithography
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Sub-40-nm pattern replication with 。゙20% process latitude by soft-contact x-ray lithography
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