Blank Cover Image

The dissolution behavior of tetrafluoroethylene-based fluoropolymers for 157-nm resist materials

著者名:
Ishikawa, T. ( Daikin Industries, Ltd. (Japan) )
Kodani, T. ( Daikin Industries, Ltd. (Japan) )
Koh, M. ( Daikin Industries, Ltd. (Japan) )
Moriya, T. ( Daikin Industries, Ltd. (Japan) )
Araki, T. ( Daikin Industries, Ltd. (Japan) )
Aoyama, H. ( Daikin Industries, Ltd. (Japan) )
Yamashita, T. ( Daikin Industries, Ltd. (Japan) )
Toriumi, M. ( Daikin Industries, Ltd. (Japan) )
Hagiwara, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Furukawa, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Itani, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) and NEC Electronics Corp. (Japan) )
Fujii, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
さらに 7 件
掲載資料名:
Advances in Resist Technology and Processing XXI
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5376
発行年:
2004
開始ページ:
169
終了ページ:
177
総ページ数:
9
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452894 [0819452890]
言語:
英語
請求記号:
P63600/5376.1
資料種別:
国際会議録

類似資料:

1 国際会議録 Characterization of TFE/norbornene-based fluoropolymer resist for 157-nm lithography

Hagiwara, T., Furukawa, T., Itani, T., Fujii, K., Ishikawa, T., Koh, M., Kodani, T., Moriya, T., Yamashita, T., Araki, …

SPIE - The International Society of Optical Engineering
7 国際会議録 Dry-etch resistance of fluorine functionalized polymers

Koh, M., Ishikawa, T., Araki, T., Aoyama, H., Yamashita, T., Yamazaki, T., Watanabe, H., Toriumi, M., Itani, T.

SPIE-The International Society for Optical Engineering
2 国際会議録 Development and characterization of new 157-nm photoresists based on advanced fluorinated polymers

Yamazaki, T., Furukawa, T., Itani, T., Ishikawa, T., Koh, M., Araki, T., Toriumi, M., Kodani, T., Aoyama, H., Yamashita, …

SPIE-The International Society for Optical Engineering
8 国際会議録 157-nm single-layer resists based on advanced fluorinated polymers

Shida, N., Watanabe, H., Yamazaki, T., Ishikawa, S., Toriumi, M., Itani, T.

SPIE-The International Society for Optical Engineering
3 国際会議録 Novel main-chain-fluorinated polymers for 157-nm photoresists

Toriumi, M., Koh, M., Ishikawa, T., Kodani, T., Araki, T., Aoyama, H., Yamashita, T., Yamazaki, T., Furukawa, T., Itani, …

SPIE-The International Society for Optical Engineering
9 国際会議録 Advances in resist pattern transfer process using 157-nm lithography

Furukawa, T., Hagiwara, T., Kawaguchi, E., Matsunaga, K., Suganaga, T., Itani, T., Fujii, K.

SPIE - The International Society of Optical Engineering
4 国際会議録 Synthesis of novel fluorinated norbornene derivatives for 157-nm application

Koh, M., Ishikawa, T., Toriumi, M., Araki, T., Yamashita, T., Aoyama, H., Yamazaki, T., Furukawa, T., Itani, T.

SPIE-The International Society for Optical Engineering
10 国際会議録 Synthesis of novel fluoropolymers for 157-nm photoresists by cyclopolymerization

Kodama, S., Kaneko, I., Takebe, Y., Okada, S., Kawaguchi, Y., Shida, N., Ishikawa, S., Toriumi, M., Itani, T.

SPIE-The International Society for Optical Engineering
5 国際会議録 Fluoropolymer resists for 157-nm lithography

Toriumi, M., Shida, N., Watanabe, H., Yamazaki, T., Ishikawa, S., Itani, T.

SPIE-The International Society for Optical Engineering
11 国際会議録 Performances of resists for 157-nm lithography based on monocyclic fluoropolymers

Ishikawa, S., Irie, S., Itani, T., Kawaguchi, Y., Yokokoji, O., Kodama, S.-.

SPIE-The International Society for Optical Engineering
6 国際会議録 Resist materials for 157-nm lithography

Toriumi,M., Ishikawa,S., Miyoshi,S., Naito,T., Yamazaki,T., Watanabe,M., Itani,T.

SPIE-The International Society for Optical Engineering
12 国際会議録 Dry-etching resistance of fluoropolymers for 157-nm single-layer resists

Kawaguchi, Y., Irisawa, J., Kodama, S., Okada, S., Takebe, Y., Kaneko, I., Yokokoji, O., Ishikawa, S., Irie, S., …

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12