193-nm negative resist based on acid-catalyzed elimination of polar molecules

193-nm negative resist based on acid-catalyzed elimination of polar molecules

著者名:

Sooriyakumaran, R. ( IBM Almaden Research Ctr. (USA) )

Davis, B.W. ( IBM Almaden Research Ctr. (USA) )

Larson, C.E. ( IBM Almaden Research Ctr. (USA) )

Brock, P.J. ( IBM Almaden Research Ctr. (USA) )

DiPietro, R.A. ( IBM Almaden Research Ctr. (USA) )

Wallow, T.I. ( IBM Almaden Research Ctr. (USA) )

Connor, E.F. ( IBM Almaden Research Ctr. (USA) )

Sundberg, L.K. ( IBM Almaden Research Ctr. (USA) )

Breyta, G. ( IBM Almaden Research Ctr. (USA) )

Allen, R.D. ( IBM Almaden Research Ctr. (USA) )

Patel, K.S. ( IBM Microelectronics Div. (USA) )

Varanasi, P.R. ( IBM Microelectronics Div. (USA) )

さらに 7 件

掲載資料名:

Advances in Resist Technology and Processing XXI

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5376

発行年:

2004

開始ページ:

71

終了ページ:

78

総ページ数:

8

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452894 [0819452890]

言語:

英語

請求記号:

P63600/5376.1

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013725
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Advances in resist technology and processing
回次:	2004 : 21st
会議開催地:	Santa Clara, CA, USA
会議開催年:	2004.02.23-2004.02.24

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2 国際会議録 "IBM 193-nm bilayer resist: materials, lithographic performance, and optimization" Kwong,R.W., Varanasi,P.R., Lawson,M.C., Hughes,T., Jordhamo,G.M., Khojasteh,M., Mahorowala,A.P., Sooriyakumaran,R., … SPIE-The International Society for Optical Engineering	8 国際会議録 A new class of low bake resists for 193-nm immersion lithography R. Sooriyakumaran, R. DiPietro, H. Truong, P. Brock, R. Allen Society of Photo-optical Instrumentation Engineers
3 国際会議録 IBM-JSR 193-nm negative tone resist: polymer design, material properties, and lithographic performance Patel, K.S., Lawson, M.C., Varanasi, P.R., Medeiros, D.R., Wallraff, G.M., Brock, P.J., DiPietro, R.A., Nishimura, Y., … SPIE - The International Society of Optical Engineering	9 国際会議録 Reactive ion etching of 193-nm resist candidates: current platforms and future requirements Wallow,T.I., Brock,P.J., DiPietro,R.A., Allen,R.D., Opitz,J., Sooriyakumaran,R., Hofer,D.C., Meute,J., Byers,J.D., … SPIE-The International Society for Optical Engineering
4 国際会議録 Progress in 193-nm single layer resists: the role of photoacid generator structure on the performance of positive resists Allen, Robert D., Opitz, Juliann, Larson, Carl E., Wallow, Thomas I., DiPietro, Richard A., Breyta, Gregory, … American Chemical Society	10 国際会議録 193-nm positive-tone bilayer resist based on norbornene-maleic anhydride copolymers Sooriyakumaran,R., Fenzel-Alexander,D., Brock,P.J., Larson,C.E., DiPietro,R.A., Wallraff,G.M., Hofer,D.C., Dawson,D.J., … SPIE - The International Society for Optical Engineering
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