Implications of immersion lithography on 193-nm photoresists

Implications of immersion lithography on 193-nm photoresists

著者名:

Taylor, J.C. ( Univ. of Texas/Austin (USA) )

Chambers, C.R. ( Univ. of Texas/Austin (USA) )

Deschner, R. ( Univ. of Texas/Austin (USA) )

LeSuer, R.J. ( Univ. of Texas/Austin (USA) )

Conley, W.E. ( Motorola, Inc. (USA) )

Burns, S.D. ( Univ. of Texas/Austin (USA) )

Willson, C.G. ( Univ. of Texas/Austin (USA) )

さらに 2 件

掲載資料名:

Advances in Resist Technology and Processing XXI

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5376

発行年:

2004

開始ページ:

34

終了ページ:

43

総ページ数:

10

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452894 [0819452890]

言語:

英語

請求記号:

P63600/5376.1

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013725
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Advances in resist technology and processing
回次:	2004 : 21st
会議開催地:	Santa Clara, CA, USA
会議開催年:	2004.02.23-2004.02.24

類似資料:

1 国際会議録 Using scanning electrochemical microscopy to probe chemistry at the solid-liquid interface in chemically amplified immersion lithography LeSuer, R.J., Fan, F.-R.F., Bard, A.J., Taylor, J.C., Tsiartas, P., Willson, G., Conley, W.E., Feit, G., Kunz, R.R. SPIE - The International Society of Optical Engineering	7 国際会議録 New single-layer positive photoresists for 193-nm photolithography Okoroanyanwu,U., Shimokawa,T., Byers,J.D., Medeiros,D.R., Willson,C.G., Niu,Q.J., Frechet,J.M.J., Allen,R.D. SPIE-The International Society for Optical Engineering
2 国際会議録 Drag-a-drop: a characterization tool for immersion lithography [6154-182] Bassett D W, Taylor J C, Conley W, Willson C G, Bonnecaze R T SPIE - The International Society of Optical Engineering	8 国際会議録 Improving the performance of 193-nm photoresists based on alicyclic polymers Patterson,K., Okoroanyanwu,U., Shimokawa,T., Cho,S., Byers,J.D., Willson,C.G. SPIE-The International Society for Optical Engineering
3 国際会議録 Polymers for 157-nm photoresist applications:a progress report Patterson,K., Yamachika,M., Hung,R., Brodsky,C.J., Yamada,S., Somervell,M.H., Osborn,B., Hall,D., Dukovic,G., … SPIE - The International Society for Optical Engineering	9 国際会議録 Immersion Lithography: Moving Microlithography to Nanolithography J. Christopher Taylor, Charles R. Chambers, Ramzy M. Shayib, Robert J. LeSuer, Willard E. Conley American Institute of Chemical Engineers
4 国際会議録 New high-index fluids for immersion lithography [6153-11] Costner, E, Taylor, J C, Caporale, S, Wojtczak, W, Dewulf, D, Conley, W, Willson, C G SPIE - The International Society of Optical Engineering	10 国際会議録 Immersion Lithography: Moving Microlithography to Nanolithography J. Christopher Taylor, Charles R. Chambers, Ramzy M. Shayib, Robert J. LeSuer, Willard E. Conley American Institute of Chemical Engineers
5 国際会議録 Negative photoresist for 157-nm microlithography: a progress report Conley, W., Trinque, B.C., Miller, D., Caporale, S., Osborn, B.P., Kumamoto, S., Pinnow, M.J., Callahan, R., Chambers, … SPIE-The International Society for Optical Engineering	11 国際会議録 Protecting groups for 193-nm photoresists Allen,R.D., Sooriyakumaran,R., Opitz,J., Wallraff,G.M., DiPietro,R.A., Breyta,G., Hofer,D.C., Kunz,R.R., Jayaraman,S., … SPIE-The International Society for Optical Engineering
6 国際会議録 Negative photoresist for 157-nm microlithography: a progress report Conley, W., Trinque, B.C., Miller, D.A., Zimmerman, P., Kudo, T., Dammel, R.R., Romano, A.R., Willson, C.G. SPIE-The International Society for Optical Engineering	12 国際会議録 Fundamental study of photoresist dissolution with real time spectroscopic ellipsometry and interferometry Burns, S.D., Schmid, G.M., Trinque, B.C., Willson, J., Wunderlich, J., Tsiartas, P.C., Taylor, J.C., Burns, R.L., … SPIE-The International Society for Optical Engineering

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