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Liquid immersion lithography: evaluation of resist issues

著者名:
Hinsberg, W. ( IBM Almaden Research Ctr. (USA) )
Wallraff, G.M. ( IBM Almaden Research Ctr. (USA) )
Larson, C.E. ( IBM Almaden Research Ctr. (USA) )
Davis, B.W. ( IBM Almaden Research Ctr. (USA) )
Deline, V. ( IBM Almaden Research Ctr. (USA) )
Raoux, S. ( IBM Almaden Research Ctr. (USA) )
Miller, D. ( IBM Almaden Research Ctr. (USA) )
Houle, F.A. ( IBM Almaden Research Ctr. (USA) )
Hoffnagle, J. ( IBM Almaden Research Ctr. (USA) )
Sanchez, M.I. ( IBM Almaden Research Ctr. (USA) )
Rettner, C. ( IBM Almaden Research Ctr. (USA) )
Sundberg, L.K. ( IBM Almaden Research Ctr. (USA) )
Medeiros, D.R. ( IBM Thomas J. Watson Research Ctr. (USA) )
Dammel, R.R. ( Clariant Corp. (USA) )
Conley, W.E. ( Motorola, Inc. (USA) )
さらに 10 件
掲載資料名:
Advances in Resist Technology and Processing XXI
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5376
発行年:
2004
開始ページ:
21
終了ページ:
33
総ページ数:
13
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452894 [0819452890]
言語:
英語
請求記号:
P63600/5376.1
資料種別:
国際会議録

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