Simulation-based mask quality control in a production environment
- 著者名:
Pang, L. ( Synopsys, Inc. (USA) ) Chen, J.-H. ( Synopsys, Inc. (USA) ) Cai, L. ( Synopsys, Inc. (USA) ) Lee, D. ( United Microelectronic Corp. (Taiwan China) ) Chu, B. ( United Microelectronic Corp. (Taiwan China) ) Huang, V. ( United Microelectronic Corp. (Taiwan China) ) Fang, T.-Y. ( United Microelectronic Corp. (Taiwan China) ) - 掲載資料名:
- Metrology, Inspection, and Process Control for Microlithography XVIII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5375
- 発行年:
- 2004
- 開始ページ:
- 1087
- 終了ページ:
- 1097
- 総ページ数:
- 11
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452887 [0819452882]
- 言語:
- 英語
- 請求記号:
- P63600/5375.2
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
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SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
11
国際会議録
Enhancing DRAM printing process window by using inverse lithography technology (ILT) [6154-142]
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |